Location & dates EMBL Heidelberg, Germany 10 - 15 Dec 2017
Deadlines Application closed

Course Overview

This course will teach theory and practice for high-accuracy correlative light and electron microscopy.  Students will learn high-accuracy CLEM on resin embedded samples using SEM approaches (Peddie et al. 2014) as well as using TEM according to the procedures developed in the Briggs group at EMBL (Kukulski et al. 2011). The course will also cover the extension of this approach to cryo-EM specimens (Schorb and Briggs 2014), and more recently developed equipment and work flows for cryo-CLEM.

For more information you may wish to review the programme from last year´s course here.

Audience

People with experience in EM who want to further develop their skills in high-accuracy correlated microscopy.

Modules/Resources

The course will combine lectures and hands-on practical work covering all steps in the work flow: sample preparation, microscopy, and image
registration/analysis.

Learning Outcomes

Getting hands-on experience of the CLEM methods and tips from the people who developed the methods.

 

EMBL Courses and Conferences are kindly supported by our Corporate Partnership Programme

Founder partners

  • Leica logo
  • Olympus logo

Corporate partners

  • Becton Dickinson logo
  • Boehringer Ingelheim logo
  • Eppendorf logo
  • GSK logo
  • Illumina logo
  • Sartorius
  • ThermoFisher logo

Associate partners

  • Merck logo
  • NEB_logo_120
  • Nikon logo
  • Sanofi logo